Products
Chemiclean-S series
Chemiclean-D series
Chemiclean-V series
Chemiclean-U series
Chemiclean-G series
Chemiclean-E series




SYSTEM OUTLINE
 Nitrogen tri-fluoride (NF3) has been drawing attention in semiconductor manufacturing processes as a high-performance dry-etching and cleaning gas and recently its application area is gradually expanding. Since this gas is chemically quite stable at room temperature in the atmosphere, it is characterized by its easy handling within processes. However, because of its high chemical stability, it was previously not possible to treat this gas with conventional waste-gas treatment equipment.
 To overcome this obstacle, the Chemiclean-D Series was developed by fully utilizing our company's unique technology to decompose nitrogen tri-fluoride. The Chemiclean-D waste-gas treatment equipment is capable of safely and completely converting gases containing nitrogen tri-fluoride into other gases, which can easily be treatable. Today this equipment is used by many of our clients.

SYSTEM FEATURES
< COMPLETE REMOVAL AND CONVERSION TO SAFE WASTE-GAS >
 By connecting this equipment to conventional type waste-gas treatment equipment, it becomes possible to lower the concentration of nitrogen tri-fluoride below the maximum allowable level.
< DRY PROCESS AND SIMPLE OPERATION >
 Since the decomposing method used by this equipment is a simple dry process, the equipment can be handled easily and there is no need to worry about the discharge of waste water.
< HIGHLY ECONOMICAL AND EASY REPLACEMENT OF CHEMICALS >
 The running cost required for treatment is low since the power consumption is low. In addition, the replacement of metal silicon can be achieved rapidly and easily because it is based on a chemical-filling method.
< NO NEED FOR A COMBUSTIBLE GAS SUCH AS LPG OR HYDROGEN >
 Because there is no need to use a combustible gas, the unit can be easily installed and safely used.
< NO EMISSION OF GREENHOUSE GASES >
 No CO2 or other greenhouse gases that cause global warming are emitted.
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