|
| Products |
|
|
|
 |
|
 |
|
 |
|
■ SYSTEM OUTLINE
Chemical gas cleaning by ClF3 is a new method of plasma-less cleaning. This method is employed in our
Chemiclean-G Series off-line cleaning system, for various contaminated
components of PVD and CVD systems, etc.
■ SYSTEM FEATURES
< PLASMA-LESS AND DRY CLEANING >
The Chemiclean-G features plasma-less and dry cleaning
< COPES WITH VARIOUS MATERIALS >
The Chemiclean-G can clean various difficult contamination materials.
< TOTAL SYSTEM >
The Chemiclean-G is equipped with a cleaning gas supply system and exhaust gas processing system.
< WORK SAVING SYSTEM >
The Chemiclean-G can automatically clean in a short period of time.
■ EXAMPLES OF ELECTRONIC MATERIALS CLEANED
・All kinds of Silicon, Tungsten, Silicon nitride, Tantalum oxide, etc.
SUPER HARD MATERIALS
・Titanium nitride, Tungsten carbide, Titanium carbide, etc.
|
|
|
|
