Products
Chemiclean-S series
Chemiclean-D series
Chemiclean-V series
Chemiclean-U series
Chemiclean-G series
Chemiclean-E series




SYSTEM OUTLINE
 Chemical gas cleaning by ClF3 is a new method of plasma-less cleaning. This method is employed in our Chemiclean-G Series off-line cleaning system, for various contaminated components of PVD and CVD systems, etc.

SYSTEM FEATURES
< PLASMA-LESS AND DRY CLEANING >
 The Chemiclean-G features plasma-less and dry cleaning
< COPES WITH VARIOUS MATERIALS >
 The Chemiclean-G can clean various difficult contamination materials.
< TOTAL SYSTEM >
 The Chemiclean-G is equipped with a cleaning gas supply system and exhaust gas processing system.
< WORK SAVING SYSTEM >
 The Chemiclean-G can automatically clean in a short period of time.

EXAMPLES OF ELECTRONIC MATERIALS CLEANED
 ・All kinds of Silicon, Tungsten, Silicon nitride, Tantalum oxide, etc.
 SUPER HARD MATERIALS
 ・Titanium nitride, Tungsten carbide, Titanium carbide, etc. 



Company Outline | Products Guide | Location Our Office | Contact Us | Home
Link
copyright (c) Central Engineering CO., LTD. All Rights Reserved.